sputtering target

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Quality Control in Chemical Vapor Deposition (CVD)

Magnetron sputtering, a physical vapor deposition (PVD) process, is the main thin film deposition method for manufacturing semiconductor,...

Sputter deposition is the process whereby particles of the sputtering targets are sputtered out and deposited on a substrate to form a...

Metal sputtering target materials that are termed as Non-ferrous are include the following: cobalt, titanium, aluminum, chromium, zinc,...

Sputtering is widely used in industrial process because it can obtain high quality films at low temperature substrates. It is a cheap and...

In recent years, the requirements for processing technology in various industries have been continuously improved. For example, as for...

Sputter coating, also called sputter deposition, is a thin film deposition method that produces films with the highest quality films and...

As car owners, nobody don’t want they car look brand new, just as good as the day it was bought. However, there are many influencing...

Casting The alloy raw material of a certain distribution ratio is melted, and the alloy solution is poured into a mold to form an ingot,...