Advantages and Disadvantages of Magnetron SputteringMagnetron sputtering, a physical vapor deposition (PVD) process, is the main thin film deposition method for manufacturing semiconductor,...
Difference Between Magnetron Sputtering and Evaporation CoatingSputter deposition is the process whereby particles of the sputtering targets are sputtered out and deposited on a substrate to form a...
Sputtering targets used in RF sputteringSputtering is widely used in industrial process because it can obtain high quality films at low temperature substrates. It is a cheap and...